Vacuum Magnetron Sputtering Coating Machine

• Customization: Available
• After-sales Service: 1 Year
• Warranty: 1 Year
• Model NO.: TOB-1100X-SPC-16M
• Weight: 50kg
• Target: Ø50mm
• Vacuum Chamber: Ø160mm×120mm
• Max Current: 50mA
• Transport Package: Wooden Box
• Specification: 360*300*380mm
• Trademark: TOB
• Origin: China
• Production Capacity: 1000000/Month

Product Description

Vacuum Magnetron Sputtering Coating Machine

TOB-1100X-SPC-16M magnetron sputtering coater utilizes the sputtering effect produced by particle bombardment of the target material in a vacuum environment, which makes the target material atoms or molecules shoot out from the solid surface, and the process of forming a thin film is deposited on the substrate. Belongs to the physical vapor deposition (PVD) preparation of thin film technology. TOB-1100X-SPC-16M magnetron sputter coater can be used for the preparation of scanning electron microscope samples in the laboratory, and the compact size of the equipment saves space in the laboratory; the operation is simple and suitable for beginners to use.

 

Features

• It is equipped with vacuum meter and sputtering current meter, which can monitor the working status in real time.
• By adjusting the sputtering current controller and micro vacuum gas valve, it controls the vacuum chamber pressure, ionization current and selects the required ionization gas to obtain the best coating effect.
• The rubber sealing ring on the edge of the bell housing is specially designed to ensure that the glass bell housing will not be chipped in long-term use.
• Ceramic-sealed high-voltage electrode fittings are more durable than the rubber seals normally used.
• According to the ionization characteristics of the gas in the electric field, a large-capacity sputtering vacuum chamber and a corresponding area of the sputtering target are used to make the sputtered layer more uniform and pure.
• The sputter head utilizes Peltier cooling technology to obtain high performance, fine particle coatings.
• Water-cooled sputter heads and water-cooled carrier tables are available.

 

Product Name	Vacuum Magnetron Sputtering Coating Machine
Product Model	TOB-1100X-SPC-16M
Installation Condition	This equipment is required to be used at an altitude of 1000m or less, at a temperature of 25ºC±15ºCand a humidity of 55%Rh±10%Rh. 1. water: the equipment needs to be equipped with optional self-circulating cooling water machine (filling pure water or deionized water) 2. electricity: AC220V 50Hz, must have a good grounding 3. gas: equipment chamber to be filled with argon (purity 99.99% or more), need to provide their own argon gas cylinder (with pressure reducing valve) 4. Working table: size 600mm×600mm×700mm, load-bearing 50kg or more. 5. Ventilation device: not required
Major Parameter	1. Target: Ø50mm
	2. Vacuum chamber: Ø160mm×120mm
	3. vacuum degree:≤4×10-2mbar
	4, max current: 50mA (optional 100mA)
	5. Limit time can be set: 9999s
	6. Micro vacuum valve: Connect Ø3mm hose
	7. limit voltage: 1600V DC
	8. mechanical pump: 2L/s
	9. Target material: Size requirement:φ50mm×(0.1-0.5)mm(thickness) Suitable for sputtering Au, Ag, Cu and other metals (available in our company)
	10. Size: 360mm×300mm×380mm Overall weight: 50Kg, Net weight: 15Kg